Indirect and direct band gaps in silicon

In summary, the conversation discusses the band structure of silicon and how it changes in bulk and nano crystals. It is noted that in bulk silicon, an indirect band gap occurs and that reducing the size of silicon results in a more direct band gap. However, there is no single reason for why some materials have a direct band gap and others have an indirect band gap. Factors such as lattice parameters, crystal symmetry, and nature of orbitals all play a role in determining the band structure. Additionally, it is mentioned that geometry and particle size can also affect the band structure, using the example of MoS2 as a layered material.
  • #1
Aun-shi
1
0
Hi

This semester my group and I are calculating the band structure of silicone (bulk and nano crystals).
In bulk silicon a indirect band gap occurs, where the highest occupied valence band and the lowest unoccupied conduction band are situated at different k-values.

Does anyone know why this actually happens? If you have some literature that gives a valid explanation I would appreciate it.

Another interesting thing is when quantum confining silicon structure the indirect band gap becomes direct. Does anyone know why reducing the size of silicon result in a more direct band gap? Also here if anyone has some literature that explains it I would appreciate it.


Thanks!
 
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  • #2
There isn’t a single reason for why some materials have a direct band gap and others have an indirect band gap. The lattice parameters, crystal symmetry, and nature of the orbitals involved will all play a role in determining the band structure of the material, and I doubt there’s an easy way to tell whether the gap will be direct or indirect without explicitly solving the electronic structure.

That said, you are correct that geometry and particle size can play a role in band structure. A very famous recent example is MoS2, which has a layered structure. A single layer has a direct band gap whereas 2 or more layers stacked in their native rhombohedral state have an indirect gap.
 

1. What is the difference between indirect and direct band gaps in silicon?

The band gap in a material refers to the energy difference between the highest energy level of the valence band and the lowest energy level of the conduction band. In silicon, the band gap can either be indirect or direct. In indirect band gap materials, the energy levels of the electrons in the conduction band do not align with the energy levels of the holes in the valence band. This results in a lower efficiency of light absorption as electrons need to undergo a change in momentum to transition from the valence band to the conduction band. On the other hand, in direct band gap materials, the energy levels of the electrons and holes align, making it easier for electrons to transition from the valence band to the conduction band, resulting in a higher efficiency of light absorption.

2. How does the band gap affect the properties of silicon?

The band gap of silicon plays a crucial role in determining its properties. A smaller band gap leads to the material being a better conductor of electricity, while a larger band gap results in the material being a better insulator. This makes silicon suitable for a wide range of applications, from semiconductor devices to solar cells. The band gap also influences the color of the material, with materials having a smaller band gap appearing more red or infrared, while those with a larger band gap tend to appear more blue or ultraviolet.

3. Can the band gap of silicon be modified?

Yes, the band gap of silicon can be modified through various methods such as doping, strain engineering, and quantum confinement. Doping involves introducing impurities into the silicon crystal, which can either increase or decrease the band gap depending on the type of impurity. Strain engineering involves applying mechanical stress to the crystal, which can alter the energy levels of the electrons and result in a modified band gap. Quantum confinement refers to the confinement of particles in a small space, which can lead to a change in the band gap due to the reduced dimensions of the material.

4. What are the advantages and disadvantages of direct and indirect band gap silicon?

The main advantage of direct band gap silicon is its higher efficiency in light absorption, making it suitable for applications such as solar cells and photodetectors. On the other hand, indirect band gap silicon has the advantage of being a better insulator, making it useful in electronic devices that require high resistivity. However, the efficiency of indirect band gap silicon in light absorption is lower compared to direct band gap silicon, making it less suitable for optoelectronic applications.

5. Can the band gap of silicon be engineered for specific applications?

Yes, the band gap of silicon can be engineered to suit specific applications by modifying its structure and composition. By altering the size, shape, and orientation of the silicon crystal, the band gap can be tuned to meet the requirements of different electronic and optoelectronic devices. This allows for the customization of silicon for various applications, making it a versatile material in the field of science and technology.

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