- #1
kimmylsm
- 19
- 0
In deposition of thin film on a p-type silicon, how to make sure the thickness of the thin film will not affect or affect the least the electrical(Hall Effect) and structural properties? how to know how thick is the thin film that most suitable? can it be calculated? by the way, the thin film deposited is zinc oxide using sol-gel and spin coating(where thickness depend on speed are set)?