- #1
samin
- 1
- 0
Hello all,
Can somebody explain to me what PEC (proximity effect control) means in nanofabrication?
Thanks
:)
Can somebody explain to me what PEC (proximity effect control) means in nanofabrication?
Thanks
:)
Proximity effect control in ebeam lithography refers to the techniques used to minimize the effects of electron scattering and secondary electron generation during the exposure process. These effects can cause distortions and blurring in the final pattern, resulting in reduced resolution and accuracy.
Proximity effect control works by adjusting the exposure parameters, such as beam energy and proximity gap, to reduce the distance between the electron beam and the substrate. This decreases the amount of scattering and secondary electron generation, resulting in improved pattern fidelity.
Proximity effect control is important in ebeam lithography because it directly affects the resolution and accuracy of the patterns being created. Without proper control, the proximity effect can lead to distorted and inaccurate patterns, which can be detrimental in applications such as microelectronics and nanofabrication.
There are several techniques used for proximity effect control in ebeam lithography, including variable shaped beam (VSB) writing, dose modulation, and proximity gap correction. These techniques involve adjusting the exposure parameters and/or using specialized hardware to minimize the proximity effect.
Proximity effect control has a direct impact on the resolution and accuracy of ebeam lithography. By reducing the proximity effect, the resolution can be improved, resulting in smaller and more precise patterns. This also improves the accuracy of the patterns, ensuring that they are reproduced correctly on the substrate.