An E-Beam, short for electron beam, is a stream of electrons used in scientific and industrial applications for precision imaging, machining, and analysis at the nanoscale level.
E-Beam size is calculated using the equation: beam size = current (pA) * pattern size (um). In this case, the beam size would be 5pA * 40um = 200pA um.
5pA and 40um are used in the calculation to determine the size of the electron beam based on the current and pattern size. These values are commonly used in E-Beam experiments and can be adjusted to achieve different beam sizes.
The E-Beam size directly affects the resolution of an experiment. A smaller beam size allows for higher resolution imaging and precision manipulation of materials. However, using a larger beam size can result in faster processing times.
E-Beam technology has a wide range of applications, including semiconductor manufacturing, lithography, materials science, and biological research. It is also used in electron microscopes for high-resolution imaging of biological and non-biological samples.