Ion implantation on a target

[Panthera Leo]

This question might sound very simple, but I couldn't find a relevant answer by googling;

Assume Fe³⁺ is to be implanted in some target, how to get the 3+ ions to be implanted and not the 2+ or 1+ ?

Thanks for your contributions.

 

[DMC101]

This question might sound very simple, but I couldn't find a relevant answer by googling;

Assume Fe³⁺ is to be implanted in some target, how to get the 3+ ions to be implanted and not the 2+ or 1+ ?

Thanks for your contributions.

First, I cannot imagine you implanting iron because it contaminates anything in an implanter that it touches (and it's ferrous).

However, you would need a final energy magnet at an angle that strips any energy contamination from the beam. Your analyzer magnet would do most of that, but you would pick up neutral contaminants (your bigger problem) and those along with the energy contaminants (+ and ++) would be filtered in the FEM.

Hope this helps.

If you are talking about plasma implantation with HV to a target, you cannot control the energy level that well, which is why diffusion style doping is ok for coating substrates, but not for controlling depth of implant or for voltage threshold adjust type applications.