I'm attempting to research information on Ar+ sputtering on a sample of Al(111) in UHV (10-10mbar region) for the purpose of sample cleaning in conjunction with annealing, however I've hit a bit of a block. My main method of research has been to trawl through journal after journal to get pointers from what others have done only I've not actually been able to find any information that really helps. Can anyone explain to me what I am supposed to take into account in this. For example, how I would go about establishing the ratio of voltage to gas density in a dc sputtering system and the angle at which the target would need to be bombarded from. My apologies for not using the template provided.