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Crystallization of HfO2

  1. Feb 15, 2007 #1
    HfO2 is considered to be used as a dielectric but if it crystallizes locally its electrical properties becomes unstable. This happens around 700-800 C, which is below where most semiconductor anneals require. Shouldn't this preclude its use?
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  3. Feb 22, 2007 #2


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  4. Feb 22, 2007 #3
    Thanks for the paper link, very interesting. The conducting AFM is telling, since it always detects current through the dielectric, just a matter of degree of uniformity.
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