Please, give me some advices on how to etch SnO2 thin films. For wet etching, I tried HCl (5%), NH3Cl, and HF. They seem to not etch SnO2 or the time I put the SnO2 in the solution was too short (<5 mins). I used RIE with CHF3/Ar to etch SnO2. The RIE worked but the etching rate was so slow, 1-2 nm/mins. I tried to increase the RF plasma power 100, 150, 200 W and the CHF3/Ar gas ratios but the etching rate seemed to be the same. Many thanks in advance.