High Vacuum Etch / Deposition Vacuum Gauge Question ?

[wadeio]

Hi everybody, this is my 1st post as I am a little stuck.
I am putting together a short presentation for a job application and have built a Tool similar to the attached ( basic ) schematic,
My question is

What is the Purpose of the Active Inverted Magnetron ( AIM ) - ( on the chamber ) and the CM Guage ?

I believe the CM measures the Vac level in Torr and so does the AIM, does the AIM work as an interlock for certain process's to start depending on Vacuum level ?

Also are the Piranni's used as Vacuum level interlocks to allow the transfer gate / slit valve open to transport the wafer

Thanks in advance

 

[LightHero]

for any help or adviceThe active inverted magnetron (AIM) is used to control the pressure inside the chamber, while the CM gauge measures the vacuum level in Torr. The AIM works as an interlock for certain processes to start depending on the vacuum level, while the Piranis are used as vacuum level interlocks to allow the transfer gate/slit valve open to transport the wafer. The combination of these two components helps to ensure that the pressure and temperature inside the chamber are controlled, providing a safe environment for the wafer.