Can someone give me a lil input on this problem. The production rate of good chips per hour in a microelectronics lithographic production line is given by the product of throughput, V, and yield of good chips, n. V(chips/h) = 125 - 50t + 5t^2 n= 1 / [(1+D*a)^4] where the defect density, D, increases as the thickness, t (micrometers), of the chihp decreases: D=0.75t^-3. The active area per chip site a = 0.25cm^2. Find the thickness t that maximizes the production rate. Calculate also the optimal throughput. [Starting with a search region of .5(< or =) t (< or =) 2.5 use the bisection method to reduce the search region to 0.5 micrometers and then switch to the Newton-Raphson method. You should use an Excel, Maple, or MATLAB program to do the calculation.