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Problem on PVD

  1. Oct 16, 2014 #1

    kelvin490

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    Gold Member

    Is it possible to use vacuum evaporation, sputtering and ion plating processes to coat the inside walls of holes and other hollow shapes of substrates? I wonder whether the source materials are ejected in the form of atoms or ions? Many books say atom but how can they travel to the substrate if they don't have charge?

    I have looked for several text books but cannot get a confirmed answer.
     
  2. jcsd
  3. Oct 21, 2014 #2
    Thanks for the post! Sorry you aren't generating responses at the moment. Do you have any further information, come to any new conclusions or is it possible to reword the post?
     
  4. Oct 21, 2014 #3
    Yes, but lots of technical challenges. Most vacuum deposited coating are line of sight, but lots of ways to skin a cat.

    CVD might be considered.

    Your question on ions or atoms, which process type? Fundamental are available in all over the place.
     
  5. Dec 22, 2015 #4
    ALD is the best choice.
     
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