Semiconductors - role of displaced Silicon or Germanium

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    Semiconductors Silicon
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Discussion Overview

The discussion revolves around the role of displaced Silicon or Germanium atoms in semiconductor doping processes, specifically when these materials are doped with pentavalent or trivalent impurities. The focus includes theoretical implications and potential interactions within the crystal lattice.

Discussion Character

  • Exploratory, Technical explanation, Debate/contested

Main Points Raised

  • One participant describes the process of doping pure Germanium or Silicon and questions the fate of the replaced atoms within the crystal structure.
  • Another participant speculates that the displaced silicon atom may become mobile and interact with other impurities, potentially creating additional energy states within the bandgap, though they acknowledge their lack of direct experience in semiconductor manufacturing.
  • A different participant states that the dopant either replaces an atom or becomes an interstitial within the lattice.
  • A follow-up question is posed regarding whether the displaced atom remains stationary when it becomes interstitial.

Areas of Agreement / Disagreement

Participants express varying viewpoints on the behavior of displaced atoms, with some suggesting mobility and interaction with impurities, while others focus on the structural role of the dopant. The discussion remains unresolved regarding the specific behavior of displaced atoms.

Contextual Notes

The discussion includes speculative elements and acknowledges limitations in participants' direct experience with semiconductor manufacturing processes, which may affect the accuracy of their claims.

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Semiconductors -- role of displaced Silicon or Germanium

Revered Members,
When we dope a pure Germanium or Silicon with pentavalent impurity or trivalent impurity, the dopant replaces Silicon or Germanium and bonds with neighbouring Si or Ge atom. That is Dopant takes the centre position and bonds with 4 neighbouring atoms.
Now where do that replaced Si or Ge go in the crystal?
 
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I work with a lot of silicon, but I might not be able to answer this, since I am pretty far removed from the manufacturing process. I would imagine the silicon atom that gets displaced becomes mobile and interacts with any other impurities inside the device (such as oxygen impurities that are usually always present, even for high grade silicon), and creates additional energy states within the bandgap (but not a very large concentration, as to not effect greatly the electrical properties of the crystal itself). I am sure with accelerated annealing you can somehow remove these mobile silicon atoms in the crystal (or neutralize their effects). This is all highly speculative, as like I said, I am not involved in the manufacturing process. I would actually like to know the answer myself, so any experts in the growth of semiconductor crystals should chime in.
 


The dopant either replaces an atom or becomes an interstitial (lies between the atoms of the lattice)
 


Thanks for the replies. @Dr Transport: Does the displaced atom lie stationary when it becomes interstitial?
 

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