hi all its an RBS ( rutherford back scattering) experiment. a Si3N4 thin film deposit on a Si substrat. we make a spectrometry analysis, and we obtain the scattering yield spectrum. now back to chemistry, if we made an oxydation for this thin film while it deposite on the substrat, we'r gonna obtain a new thin film of: SiO2 or SiOxNy ? and why? i cant really solve this question. its really a chemistry question, maybe its about electronegativity of elements.