Discussion Overview
The discussion revolves around the feasibility of achieving a near perfect flat surface with a roughness of 1-10 nm. Participants explore the challenges associated with achieving such precision in surface flatness, particularly in the context of materials and applications.
Discussion Character
- Exploratory
- Technical explanation
- Debate/contested
Main Points Raised
- One participant questions the possibility of achieving a near perfect flat surface with a roughness of 1-10 nm and asks about the difficulty involved.
- Another participant cites carbon face seals as an example of extremely flat surfaces, mentioning specific flatness measurements and suggesting that discussing surfaces in nanometers may lead to macroscopic issues.
- A participant claims to routinely produce samples with a flatness and parallelism of less than 100 nm over a specific area, noting the challenges and costs associated with improving flatness.
- There is a repeated inquiry about the material, size of the active area, and budget related to achieving the desired flatness.
- One participant describes their polishing process for Gallium Arsenide, emphasizing the need for low tolerance due to the measurement of quantum transport phenomena in quantum well structures.
Areas of Agreement / Disagreement
Participants express varying views on the feasibility and difficulty of achieving the desired surface flatness, with no consensus reached on the possibility of achieving 1-10 nm roughness. The discussion includes both technical insights and personal experiences, indicating a range of perspectives on the topic.
Contextual Notes
The discussion highlights the dependence on specific materials and applications, as well as the challenges related to polishing techniques and monetary investment. There are unresolved questions regarding the exact requirements for achieving the proposed surface flatness.