Recent content by jarodparker198

Hello, I have in mind two papers: - The first paper concerns the InSb material (J. Appl. Phys. 64, 2813 (1988); doi: 10.1063/1.341589) - The second the InP and AsGa materials (Journal of Vacuum Science & Technology B 11, 2033 (1993); doi: 10.1116/1.586539) In these two papers, they used UV...

Yes you are probably right concerning the natural oxidation. However I read in some papers that the natural oxide is chemically removed before the controlled oxidation of the substrate for further optronic applications. The control of the oxide seems to be the major point, and that depends of...

Hello Zz, I thank you for your response. To be more precise, I am not talking about deposited layers of III-V materials. I am more talking about bulk materials like wafers of AsGa, InP or InSb. What are the best techniques to oxidize the surface of wafers of III-V materials ?

Hello, In the framework of an academic study, I am reviewing the oxidation methods of III-V materials for optronic applications. What are the best techniques to oxidize III-V materials such as InP, AsGa, or InSb in order to have a good quality oxide layer of about thirty nanometers? The oxide...