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osskall
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Hi! Is silicon inert? i.e. can I clean it from deposited films with e.g. HNO3 and H2SO4 without etching the silicon itself? What about amorphous carbon?
Can Silicon and Carbon Be Cleaned Without Etching?
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SUMMARY
This discussion centers on the cleaning of silicon and amorphous carbon without etching. It confirms that silicon can be cleaned using nitric acid (HNO3) and sulfuric acid (H2SO4) without damaging the silicon itself. For amorphous carbon, physical methods such as "sandpaper" are effective, while chemical cleaning can be performed using hydrochloric acid (HCl), nitric acid (HNO3), and perchloric acid (HCLO4). Common etchants for silicon include hydrofluoric acid (HF) and caustics like sodium hydroxide (NaOH) and potassium hydroxide (KOH).
PREREQUISITES- Understanding of silicon cleaning processes
- Familiarity with chemical etching agents like HNO3, H2SO4, and HF
- Knowledge of amorphous carbon properties and cleaning techniques
- Basic chemistry concepts related to acids and bases
- Research the effects of HNO3 and H2SO4 on silicon surfaces
- Explore alternative cleaning methods for amorphous carbon
- Learn about the role of HF in silicon etching
- Investigate the use of physical abrasion techniques for carbon cleaning
Materials scientists, semiconductor manufacturers, and anyone involved in the cleaning and processing of silicon and carbon materials.
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