Recent content by krik krik krik

  1. K

    What is the energy gap of Titanium Nitride (TiN) and is it indirect or direct?

    Hello all, Does anyone knows what is the exact energy gap of Titanium Nitride (TiN) film? Is it indirect band gap or direct band gap? From literatures, I've found that the band gap for TiN is around 3.35-3.45eV. . May someone could suggest the specific band gap for TiN? Thanks.
  2. K

    Chemical reaction of electrochemical etching

    Oh yeah? So, that's mean ethanol and DMF just stabilized the products to gives different type of morphology! Thanks for the explanation. Very pleased indeed.
  3. K

    Chemical reaction of electrochemical etching

    Thanks for the suggestion. But from my point of view, these organic solvent plays an important role for uniformity and well-define shapes of my porous structure. Either ethanol or DMF gives us different morphology of porous Si. Sort of 'tricky' reaction involved in this etching process that i...
  4. K

    Chemical reaction of electrochemical etching

    Hopefully somebody can correct me if I'm wrong. This is what I've found : 1) Si (silicon wafer) + HF (hydroflouric acid)+ C2H5OH(ethanol) = H2SiF6+ C2H6 + H2O + H2 2) Si + HF + C2H5OH + H202 (hydrogen peroxide)= H2SiF6+ C2H5F + H2O+ H2O2+H2 3) Si + HF + (CH3)2NC(O)H (dimethylformamide)=...
  5. K

    Chemical reaction of electrochemical etching

    Greetings all, I have some questions regarding to chemical reaction between Silicon,Si (wafer) and chemical dissolution. FYI, I'm doing electrochemical ething to fabricate porous Si. Could anyone help me to solve this chemical reactions? 1) Si (silicon wafer) + HF (hydroflouric acid)+...
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