Removal of residual colloidal silica from metallography sample

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SUMMARY

The discussion focuses on the removal of residual colloidal silica from metallography samples mounted in Bakelite. The user experienced difficulties with Energy Dispersive Spectroscopy (EDS) and high-resolution Scanning Electron Microscopy (SEM) due to residual silica after polishing with a Vibromet. Attempts to clean the sample using a fresh polishing cloth and water were ineffective. The user seeks effective cleaning techniques to prepare the sample for imaging primary and eutectic silicon phases.

PREREQUISITES
  • Understanding of metallography sample preparation techniques
  • Familiarity with Vibromet polishing equipment
  • Knowledge of EDS and SEM imaging techniques
  • Experience with colloidal silica and its effects on sample analysis
NEXT STEPS
  • Research effective cleaning methods for metallography samples, including chemical cleaning agents
  • Learn about alternative polishing techniques to minimize residual contaminants
  • Investigate the use of ion milling as a sample preparation method
  • Explore best practices for preparing samples for EDS and SEM analysis
USEFUL FOR

Metallurgists, materials scientists, and laboratory technicians involved in sample preparation and analysis using EDS and SEM techniques.

Dave_H
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Hey there,
I've been having some issues with residual colloidal silica on a metallography sample (mounted in Bakelite). I used a Vibromet for several hours as my final stage of polishing which gave me a really nice polish, but now I'm having trouble with EDS and high-res SEM as I'm trying to image primary/eutectic silicon phase and I have some residual colloidal messing things up.

I have tried just using a fresh polishing cloth and water, but that hasn't fully cleaned it up. Just wondering if anyone has any neat tricks to clean up a sample?

Thanks,
 
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