Anyone using NMP (methylpyrrolidone)?

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SUMMARY

The discussion focuses on the use of N-Methyl-2-Pyrrolidone (NMP) for cleaning sensitive devices made from patterned niobium on SiO2/Si or sapphire substrates. The original poster has been using warm acetone followed by isopropyl alcohol (IPA) but is seeking a more effective cleaning solution due to incomplete removal of organic impurities. Concerns about the safety of NMP on niobium surfaces are raised, with references to a relevant journal paper discussing similar applications. The paper titled "Conducting polymer cathodes for high-frequency operable electrolytic niobium capacitors" provides insights into the use of NMP in related contexts.

PREREQUISITES
  • Understanding of N-Methyl-2-Pyrrolidone (NMP) properties and applications
  • Familiarity with cleaning techniques for sensitive electronic devices
  • Knowledge of niobium and its interactions with solvents
  • Access to scientific literature for research purposes
NEXT STEPS
  • Research the chemical compatibility of NMP with niobium surfaces
  • Investigate alternative cleaning methods for sensitive materials
  • Review the journal article "Conducting polymer cathodes for high-frequency operable electrolytic niobium capacitors"
  • Explore best practices for cleaning techniques in microfabrication
USEFUL FOR

This discussion is beneficial for materials scientists, cleanroom technicians, and researchers involved in the fabrication and maintenance of electronic devices, particularly those working with niobium and sensitive substrates.

f95toli
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I need some advice about using NMP (methylpyrrolidone,i.e. N-Methyl-2-Pyrrolidone) to clean samples.
At the moment I am measuring devices that are made from 200 nm of patterned niobium on top of SiO2/Si or sapphire substrates. The devices are very sensitive to the properties of the surface, any form of organic impurities, dirt, resist residues etc will degrade the performance. It is therefore important to clean them properly.
Up until now I have been using warm acetone followed by IPA to clean them. This usually works reasonaly well but does not always remove all the organics).

Anyway, a colleagues recommended trying NMP instead. However, I have no experience with NMP and I am a bit worried that it might damage the niobium somehow.

Does anyone know if NMP is as "safe" as e.g. acetone when it comes to cleaning metal surfaces?
 
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f95toli said:
I need some advice about using NMP (methylpyrrolidone,i.e. N-Methyl-2-Pyrrolidone) to clean samples.
At the moment I am measuring devices that are made from 200 nm of patterned niobium on top of SiO2/Si or sapphire substrates. The devices are very sensitive to the properties of the surface, any form of organic impurities, dirt, resist residues etc will degrade the performance. It is therefore important to clean them properly.
Up until now I have been using warm acetone followed by IPA to clean them. This usually works reasonaly well but does not always remove all the organics).

Anyway, a colleagues recommended trying NMP instead. However, I have no experience with NMP and I am a bit worried that it might damage the niobium somehow.

Does anyone know if NMP is as "safe" as e.g. acetone when it comes to cleaning metal surfaces?

I read a journal paper once that used a similar technique successfully. The paper was entitled:

Conducting polymer cathodes for high-frequency operable electrolytic niobium capacitors, Journal of Synthetic Metals, Volume 74, Issue 2, (1995) pages 165-170.

CS
 
Thanks for the reference.
Unfortunately, it seems I do not have access to that journal. I will try to see if I can get hold of that paper on Monday.
 

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