Finding the Best Spin-Coating Thickness Model

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gkiverm
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I'm planning to deposit a thin layer of a gel (~10 - 100 uM), which will later be heat cured using a spin-coater. I've looked at a few models to predict the thickness of the gel based on experimental parameters (rpm, viscosity, time, etc.) but am still unsure on which model is the best to go with. Some of the papers I've looked at...

1) http://scitation.aip.org/docserver/fulltext/aip/journal/jap/29/5/1.1723300.pdf?expires=1405288372&id=id&accname=2098200&checksum=5FCAD27BDE3C78763F0067815FB0BC34

2) http://scitation.aip.org/docserver/fulltext/aip/journal/jap/56/4/1.334049.pdf?expires=1405290946&id=id&accname=2098200&checksum=DA1B621E7F9DD6BDB4490AFD442D0674

A good amount of the math is too complicated for me, so I'm just looking for an equation/model I can use to predict what experimental parameters I should use to achieve a certain thickness (roughly).

Thank you
 
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Photoresist manufacturers typically list the expected layer thickness dependence on rpm, time, etc... on their material spec sheet. These numbers are nominal, and some trial and error is expected.

I don't know what type of gel your using, but maybe you can compare it to a known photoresist.
 
I have been looking for this product/service and I found this one used spin coater I am not sure about the quality or the origin of their offering. Has anyone have looked into this before? If you have any other options you know are worth the time to check out, please post them here. Thanks!