Nickel silicide (NiSi) is utilized for ohmic contact in semiconductors due to its unique electrical properties, specifically its work function. Unlike nickel, which has a higher work function, NiSi enables ohmic contact by providing a lower barrier for charge carriers. This discussion clarifies that the application of NiSi in semiconductor technology is distinct from that of nickel, emphasizing its role in enhancing electrical conductivity and performance in devices.
PREREQUISITESElectrical engineers, semiconductor researchers, and materials scientists interested in the fabrication and optimization of ohmic contacts in semiconductor devices.
I'm not trying to use nickel for Ohm contact. Nickel silicide is used for ohmic contact differently from nickel, so we just want to know what difference NiSi becomes ohmic contact differently from Ni.berkeman said:Can you post some links to the reading that you have been doing about this? Why do you want to use Ni in an Ohmic contact with a semiconductor? What is the application?