The discussion focuses on the conditions under which nickel silicide (NiSi) can form an ohmic contact with semiconductors, particularly in relation to its work function compared to nickel (Ni). Participants explore the theoretical basis for ohmic contacts and the specific applications of NiSi in this context.
The discussion reflects some disagreement regarding the conditions necessary for NiSi to form an ohmic contact, with participants expressing different understandings of the material properties and applications involved.
Participants have not fully resolved the assumptions regarding work function differences and their implications for ohmic contact formation. The discussion also highlights a potential lack of clarity about the specific applications of NiSi in semiconductor technology.
I'm not trying to use nickel for Ohm contact. Nickel silicide is used for ohmic contact differently from nickel, so we just want to know what difference NiSi becomes ohmic contact differently from Ni.berkeman said:Can you post some links to the reading that you have been doing about this? Why do you want to use Ni in an Ohmic contact with a semiconductor? What is the application?