- #1
atomica68
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I am interested in adding simultaneously O2 and H2 in a magnetron sputtering discharge ignited in Ar at a pressure of 3*10-2 mbar. The discharge is driven by a RF generator (13.56 MHz, 60 - 120W). The target is W. Can anyone told me if I can expect at any explsion to apear due to simultanoously presence of O2 and H2 in the discharge?
Thank you in advance for responses.
Thank you in advance for responses.