Why is Isopropanol used after Acetone in cleaning procedures?

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Discussion Overview

The discussion revolves around the necessity of using Isopropanol after Acetone in cleaning procedures, particularly in semiconductor device fabrication and ultra-high vacuum systems. Participants explore the reasons behind this cleaning sequence, focusing on the properties of Acetone and Isopropanol and their effects on surface contamination.

Discussion Character

  • Exploratory
  • Technical explanation
  • Debate/contested

Main Points Raised

  • Some participants suggest that Isopropanol is used after Acetone due to the high evaporation rate of Acetone, which may lead to residue formation if not followed by a rinse.
  • Others argue that Acetone can leave behind non-volatile residues, which Isopropanol can effectively dissolve, thus preventing streaks on substrates.
  • A participant mentions that using DI water directly after Acetone is not recommended, possibly due to water's inability to dissolve Acetone or the risk of water reacting poorly with certain materials.
  • One participant notes that Acetone has a tendency to oligomerize, forming residues over time, while Isopropanol does not have this issue.
  • There is a discussion about the implications of Acetone's evaporation rate and how it might affect the redeposition of contaminants if drying occurs too quickly.

Areas of Agreement / Disagreement

Participants express multiple competing views regarding the reasons for using Isopropanol after Acetone, with no consensus reached on the definitive role of evaporation rate versus residue dissolution.

Contextual Notes

Participants highlight limitations in understanding the chemical interactions involved, particularly regarding the effectiveness of DI water compared to Isopropanol in this cleaning context.

pangru
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In the semiconductor device fabrication procedures, common cleaning recipe includes Acetone and just after it, Isopropanol cleaning.
My question is, Why do we need Isopropanol cleaning after acetone?

As answers of this question says, Isopropanol must be used after acetone cleaning, due to high evaporation rate of acetone
https://www.quora.com/What-are-the-...ing-in-the-order-Acetone-Methanol-Isopropanol

This point is not clear for me, since nobody waits for acetone to evaporate. what will be wrong if I do Aceton + DI water + drying?
 
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pangru said:
In the semiconductor device fabrication procedures, common cleaning recipe includes Acetone and just after it, Isopropanol cleaning.
My question is, Why do we need Isopropanol cleaning after acetone?

As answers of this question says, Isopropanol must be used after acetone cleaning, due to high evaporation rate of acetone
https://www.quora.com/What-are-the-...ing-in-the-order-Acetone-Methanol-Isopropanol

This point is not clear for me, since nobody waits for acetone to evaporate. what will be wrong if I do Aceton + DI water + drying?

I'm not sure of all the issues in semiconductor fabrication, but in cleaning stuff for ultra-high vacuum systems, we wipe or clean with acetone and then use isopropanol or ethanol after because acetone tends to leave a residue after it evaporates.

Zz.
 
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ZapperZ said:
...of all the issues in semiconductor fabrication

More or less the same cleaning procedure for Si-wafers which are contaminated with organic impurities. Isopropanol is an excellent rinse agent for contaminated acetone.

"For substrates contaminated with organic impurities, two-stage substrate cleaning with acetone is recommended to remove organic impurities, followed by isopropanol, which removes contaminated acetone before it can form streaks on the substrate."
[PDF]
Substrate Preparation: Cleaning and Adhesion ... - MicroChemicals
 
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pangru said:
Why do we need Isopropanol cleaning after acetone?

The question is really good. I always use the standard recipe to remove organic impurities from the surface a various substrates. Maybe, a chemist can answer why it is not recommended to use DI water rinsing directly after acetone cleaning.
 
ZapperZ said:
in cleaning stuff for ultra-high vacuum systems, we wipe or clean with acetone and then use isopropanol or ethanol after because acetone tends to leave a residue after it evaporates.
So, reason to use Isopropanol after Aceton is high evaporation rate of acetone, is it right?

as I understood it is following:>> If I start drying(by Ni gas flow) sample just after acetone cleaning, aceton will evaporate so fast, before I remove by Ni gas-flow,that rinsed particles will redeposit on surface.
 
Lord Jestocost said:
why it is not recommended to use DI water rinsing directly after acetone cleaning.
That is a point :woot:
maybe water can not dissolve acetone :rolleyes:
 
pangru said:
So, reason to use Isopropanol after Aceton is high evaporation rate of acetone, is it right?

Did you read what I wrote? If acetone did not leave anything behind, regardless of whether it has a high evaporation rate or not, will we be having this conversation?

Zz.
 
Acetone has tendency to oligomerize over time and this reaction can form non-volatile residues. Isopropanol has not that problem.
 
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Indeed, acetone is a good solvent for a lot of things but tend to leave behind some gunk that in turn can be dissolved by isopropanol.
DI water might be able to remove some of those residues (but probably not all of them), but you also have the problem that many materials do NOT like water at all whereas IPA is always safe (if acetone is OK then so is IPA)
 
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ZapperZ said:
Did you read what I wrote?
:smile:

ZapperZ said:
If acetone did not leave anything behind, regardless of whether it has a high evaporation rate or not, will we be having this conversation?
It is clear what acetone leaves something behind.. I wanted to understand the role of its evaporation rate

It seem where are some other reasons why it is good to have IPA after, but evaporation rate is crucial point as well---
thank to all of you for quick and kind explanations,
:partytime:
 
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