Can I Use Gold-Coated Copper Cathode for Ni Electroplating on Gold?

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Discussion Overview

The discussion revolves around the feasibility and implications of using a gold-coated copper cathode for nickel electroplating in a nickel sulfate solution. Participants explore the electrochemical dynamics involved, including the calculation of cell potential and the effects of different electrode materials on the plating process.

Discussion Character

  • Technical explanation
  • Debate/contested
  • Exploratory

Main Points Raised

  • One participant questions whether to consider the cell potential based on Cu/Pt or Au/Pt, given the use of a gold-coated copper cathode.
  • Another participant emphasizes that the electroplating system is defined by Ni(II)/Ni, regardless of the initial electrode material.
  • Concerns are raised about the possibility of competing reactions, such as hydrogen evolution, affecting the nickel deposition process on the gold surface.
  • There is a discussion about the kinetic barriers for nickel deposition versus hydrogen production, suggesting that the choice of electrode material could significantly influence the outcome.
  • Some participants propose that successful nickel electroplating may depend on eliminating competing reactions and ensuring sufficient nickel deposition, even if it starts as dendritic structures.
  • One participant shares an intuition that nickel may deposit well on gold, but acknowledges that the actual process could be more complex.
  • It is suggested that a common practice is to first deposit a thin copper layer before nickel plating, which may facilitate better results.

Areas of Agreement / Disagreement

Participants express differing views on the mechanisms and conditions necessary for successful nickel electroplating on gold. There is no consensus on the best approach or the expected outcomes, with multiple competing perspectives on the role of the electrode materials and the nature of the electroplating process.

Contextual Notes

Participants note that the electroplating process can be influenced by various factors, including the presence of competing reactions and the specific characteristics of the electrode materials used. The discussion highlights the complexity of electrochemical systems and the need for careful consideration of these variables.

sudi
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I am using NiSO4 aqueous solution, Pt anode, Cu cathode coated with Au for Ni electroplating (at 3 V DC) on Au. Cu is not exposed to solution.
To calculate cell potential should I consider Cu/Pt or Au/Pt. If I replace Pt with graphite, whether for same 3 V DC supply Ni plating would be possible? Your suggestion will be very useful.
 
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If you are electroplating with Ni, your system is Ni(II)/Ni.

Out of curiosity - please show what you mean by calculating cell potential with Au/Pt.
 
I am not using Ni electrode...

Borek said:
If you are electroplating with Ni, your system is Ni(II)/Ni.

Out of curiosity - please show what you mean by calculating cell potential with Au/Pt.
 
Yes you do. You start with something else, but your reaction is Ni2+ -> Ni. Even if the first layer is deposited on something else, every next layer is deposited on the nickel electrode. There will be some small difference between the deposition of the first layer and deposition of next layers, but I doubt you will be able to observe it - try to estimate amount of nickel required to cover your Au or Pt electrode with monoatomic layer of Ni. How long does it take?
 
Thanks...I never thought like that...

Borek said:
Yes you do. You start with something else, but your reaction is Ni2+ -> Ni. Even if the first layer is deposited on something else, every next layer is deposited on the nickel electrode. There will be some small difference between the deposition of the first layer and deposition of next layers, but I doubt you will be able to observe it - try to estimate amount of nickel required to cover your Au or Pt electrode with monoatomic layer of Ni. How long does it take?
 
Borek said:
Yes you do. You start with something else, but your reaction is Ni2+ -> Ni. Even if the first layer is deposited on something else, every next layer is deposited on the nickel electrode. There will be some small difference between the deposition of the first layer and deposition of next layers, but I doubt you will be able to observe it - try to estimate amount of nickel required to cover your Au or Pt electrode with monoatomic layer of Ni. How long does it take?

But would your electrode be covered with monoatomic layer?

You have 4 competing reactions, all under the same voltage of the whole electrode:
1) Ni2+ -> Ni on Ni electrode, once formed
2) H+ -> H2 on Ni electrode
3) H+ -> H2 on whatever your base electrode is
4) Ni2+ -> Ni on the underlying non-Ni surface, initiating new Ni crystals.

All 4 have different kinetic barriers. And what exactly the barriers 3 and 4 are depends on what the base electrode is.

For example, if you attempt to cover an electrode with Ni, and your electrode happens to have very low kinetic barrier for H2 production, then you could be producing hydrogen and getting no Ni deposition because of your choice of electrode.

Furthermore I see no reason why you should succeed in electroplating. If the kinetic barrier on initiating new Ni crystals on the base electrode is high compared to kinetic barrier on depositing Ni on existing Ni surface, then you may well get a few dendrite Ni crystals on your electrode, and the rest of your base electrode uncovered and unplated.

So... what is necessary to get a successful electroplated monoatomic Ni cover instead of H2 or a few Ni dendrite crystals?
 
I took the question at face value - and as it asked about Ni electroplating on gold, I assumed OP uses a recipe for Ni electroplating on gold. Such recipes are designed to ensure Ni deposition and to eliminate competing reactions. You are right system can be much more complicated and it doesn't have to yield a monoatomic Ni as a first phase, but once you have enough Ni (even as dendrites) and no competing reactions, potential is still defined by the Ni(II)/Ni. Monoatomic Ni was intended rather as an example of how fast the situation can change, not as a description of what really happens, perhaps I should be more clear about it.

snorkack said:
So... what is necessary to get a successful electroplated monoatomic Ni cover instead of H2 or a few Ni dendrite crystals?

As far as I know it depends on the electrode material. I have a gut feeling Ni will deposit nicely on Au, but that's just an intuition.

What I do know is that often the best recipe for electroplating with Ni is to first electroplate with a thin copper layer (which is relatively easy on most metals), and then to proceed with nickel electroplating. Trying to deposit nickel directly - especially on steel/iron - is a serious PITA. OP clearly stated that while the copper is present, it is below gold and not exposed, so we are dealing with Ni on Au.
 

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