Finding the Minimum Thickness for Destructive Interference in Thin Films

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SUMMARY

The minimum thickness of a TiO2 film required for destructive interference when light of wavelength 515 nm is incident from air is determined to be 1081 nm. This calculation is based on the formula for destructive reflection in thin films, specifically using the equation 2t = mλ, where m = 11 for the first instance of destructive interference. The original thickness of the film was 1036 nm, necessitating an additional thickness of 45 nm to achieve the desired interference effect. The refractive indices of TiO2 and crown glass are 2.62 and 1.52, respectively.

PREREQUISITES
  • Understanding of thin film interference principles
  • Familiarity with the refractive index concept
  • Knowledge of the wavelength of light in different media
  • Ability to apply the formula for destructive interference in thin films
NEXT STEPS
  • Study the derivation and application of the thin film interference equations
  • Learn about the effects of varying refractive indices on interference patterns
  • Explore practical applications of thin film interference in optical coatings
  • Investigate the impact of film thickness on constructive and destructive interference
USEFUL FOR

Students studying optics, physicists working with thin films, and engineers involved in optical design will benefit from this discussion.

Sofija Zdjelar
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Homework Statement


A uniform film of TiO2, 1036 nm thick and having index of refraction 2.62, is spread uniformly over the surface of crown glass of refractive index 1.52. Light of wavelength 515 nm falls at normal incidence onto the film from air. You want to increase the thickness of this film so that the reflected light cancels.

What is the minimum thickness of TiO2 that you must add so the reflected light cancels as desired?

Homework Equations


Am i using the wrong formulas? The examples in my book seem to solve these kind of exercises easily... How should i solve this exercise?

The Attempt at a Solution


I have used the formula for destructive reflection from thin film, half-cycle phase shift (2t = mλ with λ = λair/nfilm). However, it is not correct. I have also tried to use the formula for destructive reflection from thin film, no relative phase shift ((2t = m + 1/2)λ), which also did not work. I have mainly used m = 1 because i read somewhere that it is 1 when calculating the minimum thickness.
 
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Hello and welcome to PF.

If you put the original value of the thickness of the film into the formula 2t = mλ, what would you get for m? Do you get an integer?
 
Hi! Thank you for answering. No, i do not get an integer...
 
Sofija Zdjelar said:
Hi! Thank you for answering. No, i do not get an integer...
OK. So, that means the original thickness of the film gives neither constructive nor destructive interference. As you increase the thickness of the film beyond the initial thickness, what would be the first value of m for which you would get destructive interference?
 
I get m = 11 (when i use the formula 2t = mλ and λ being λair/nfilm
Not sure if 11 is correct, or what I am supposed to do with it.
 
I think m = 11 is right. What is the thickness of the film that corresponds to m = 11? How would you use this to answer the question?
 
The thickness that corresponds to that m is 1081, which means that i have to add 45 nm to the existing film. I tried it and it was right! Thank you so much :-)
 
OK. Good work.
 

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