Interference in Thin Films: Determining SiO2 Layer Thickness Using a Wedge Setup

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Homework Help Overview

The discussion revolves around determining the thickness of a SiO2 layer on silicon using a wedge setup, with a focus on interference patterns observed when illuminated by light of a specific wavelength. The problem involves concepts from optics, particularly interference in thin films.

Discussion Character

  • Exploratory, Conceptual clarification, Mathematical reasoning, Problem interpretation, Assumption checking

Approaches and Questions Raised

  • Participants explore whether the fringe at the thinner end of the wedge is bright or dark and discuss the implications of phase changes upon reflection. There are attempts to calculate the thickness based on the number of observed dark fringes and the wavelength of light used. Questions arise regarding the effects of changing the wavelength and the medium surrounding the setup on the observed fringes.

Discussion Status

Participants are actively engaging with the problem, offering various interpretations and calculations regarding the interference conditions. Some have provided guidance on the equations for constructive and destructive interference, while others are questioning the assumptions made about phase changes and path differences. The discussion is ongoing with multiple interpretations being explored.

Contextual Notes

There are constraints related to the missing image that is referenced in the posts, which may affect the clarity of the problem setup. Additionally, participants note the need to consider the refractive index of materials involved when calculating thickness and interference conditions.

nomorenomore
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Homework Statement


In order to decide the thickness of a SiO2 layer(n=1.5) on Si, a wedge is prepared as shown in the picture. A total of 7 DARK fringes was observed, when light of wavelength 589nm shines prependicularly on the wedge. It is known that light reflected from the Si/SiO2 surface would have a phase change of π rad.

physexam1q3.png

( I don't know why the image cannot appear after posting, it does appear in edit mode. Here is the link:
http://s3.postimg.org/cbvntdri9/physexam1q3.png)

i) Determine whether the fringe at the thinner end of the SiO2 wedge is bright or dark. Explain briefly. (2M)
ii) Calculate the thickness of the SiO2 layer. (3M)
iii) If the setup is illuminated by a light of shorter wavelength, what chages would you expect for the number of fringes observed? Explain briefly. (2M)
iv) If the setup is placed in water(n=1.33), what changes would you expect for the number of fringes observed? Explain your answer briefly. (2M)

Homework Equations


For constructive interference, 2nt = (m+1/2)λ, m = 0, 1, 2...
For destructive interference, 2nt = mλ, m = 0, 1, 2...

The Attempt at a Solution


i) Dark? Just guess. What should I consider?
ii) 2nt = mλ, m = 7
2(1.5)t = 7*(589*10^-9)
t = 1.96*10^-7m
iii) Just guess: Because 2nt = mλ, where 2nt is a constant. When λ decreases, m has to be increased. So the number of fringes observed increases.
iv) Same? But it doesn't seem correct...

Thank you!
 
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nomorenomore said:

Homework Statement


In order to decide the thickness of a SiO2 layer(n=1.5) on Si, a wedge is prepared as shown in the picture. A total of 7 DARK fringes was observed, when light of wavelength 589nm shines prependicularly on the wedge. It is known that light reflected from the Si/SiO2 surface would have a phase change of π rad.

wedgesio2.JPG

( I don't know why the image cannot appear after posting, it does appear in edit mode. Here is the link: http://s3.postimg.org/cbvntdri9/physexam1q3.png

i) Determine whether the fringe at the thinner end of the SiO2 wedge is bright or dark. Explain briefly. (2M)
ii) Calculate the thickness of the SiO2 layer. (3M)
iii) If the setup is illuminated by a light of shorter wavelength, what chages would you expect for the number of fringes observed? Explain briefly. (2M)
iv) If the setup is placed in water(n=1.33), what changes would you expect for the number of fringes observed? Explain your answer briefly. (2M)

Homework Equations


For constructive interference, 2nt = (m+1/2)λ, m = 0, 1, 2...
For destructive interference, 2nt = mλ, m = 0, 1, 2...

You observe reflection. Interference happens between the directly reflected ray (blue) and the one, entering into the layer and reflected back from the SiO2-Si interface (red)
For constructive interference, the phase difference between the blue and red rays should be integer times 2pi. What is the phase change of the directly reflected light?
What are the correct equations for constructive and destructive interference?
 
ehild said:
You observe reflection. Interference happens between the directly reflected ray (blue) and the one, entering into the layer and reflected back from the SiO2-Si interface (red)
For constructive interference, the phase difference between the blue and red rays should be integer times 2pi. What is the phase change of the directly reflected light?
What are the correct equations for constructive and destructive interference?

The equations are
"For constructive interference, path difference = mλ, m = 0, ±1, ±2...
For destructive interference, path difference = (m + 1/2)λ, m = 0, ±1, ±2..." ?

And both the red ray and the blue ray has undergone phase change?
Since SiO2's n=1.5> air's n =1, the blue ray has phase change of pi rad.
And it's given that the red ray has a phase change of pi rad.
 
nomorenomore said:
The equations are
"For constructive interference, path difference = mλ, m = 0, ±1, ±2...
For destructive interference, path difference = (m + 1/2)λ, m = 0, ±1, ±2..." ?

And both the red ray and the blue ray has undergone phase change?
Since SiO2's n=1.5> air's n =1, the blue ray has phase change of pi rad.
And it's given that the red ray has a phase change of pi rad.
They both undergo phase change at the boundary from where the reflect.
 
ehild said:
They both undergo phase change at the boundary from where the reflect.

But the path difference between they reflect changes continuously in part a)? How should I deal with this?
 
You see a dark strip on the wedge where the thickness of SiO2 corresponds to the condition of destructive interference.The thickness depends on x, the horizontal distance from the edge and the angle of the incline - how?
 
ehild said:
You see a dark strip on the wedge where the thickness of SiO2 corresponds to the condition of destructive interference.The thickness depends on x, the horizontal distance from the edge and the angle of the incline - how?

tanθ=thickness/horizontal distance,
thickness=horizontal distance*tanθ?
 
nomorenomore said:
tanθ=thickness/horizontal distance,
thickness=horizontal distance*tanθ?
Yes. What should be the thickness at the first dark strip?
 
ehild said:
Yes. What should be the thickness at the first dark strip?

1/2λ=1/2*589=294.5nm?
 
  • #10
The wavelength 589 nm is given for air. You have to multiply the thickness by the refractive index. And the ray travels the thickness twice, once forward, then backward.
 
  • #11
ehild said:
The wavelength 589 nm is given for air. You have to multiply the thickness by the refractive index. And the ray travels the thickness twice, once forward, then backward.
Oh yes. 2*1.5*thickness=1/2λ=294.5, thickness=294.5/3=589/6nm?
 
  • #12
Good. You see the first dark fringe where the thickness is 589/6 nm. Where do you see the seventh one?
 

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