I'm not trying to use nickel for Ohm contact. Nickel silicide is used for ohmic contact differently from nickel, so we just want to know what difference NiSi becomes ohmic contact differently from Ni.berkeman said:Can you post some links to the reading that you have been doing about this? Why do you want to use Ni in an Ohmic contact with a semiconductor? What is the application?
Ohmic contact refers to the electrical connection between a metal and a semiconductor material, where the current-voltage relationship follows Ohm's law. This means that the resistance of the contact remains constant regardless of the applied voltage.
Ohmic contact with NiSi is crucial in semiconductor devices as it allows for efficient transfer of charge carriers between the metal and the semiconductor, enabling the device to function properly. It also helps in reducing energy losses at the contact interface.
The most common methods include annealing, ion implantation, and surface treatment with chemicals. These techniques help in altering the properties of the contact interface, leading to a decrease in contact resistance and achieving Ohmic behavior.
The quality of Ohmic contact can be affected by factors such as the type of semiconductor material, the thickness of the metal layer, the annealing temperature, and the cleanliness of the contact surface. It is essential to optimize these parameters to achieve a low resistance contact.
The quality of Ohmic contact can be evaluated by measuring the contact resistance, which should be low and stable. Other characterization techniques include current-voltage measurements, transmission line method, and four-point probe measurements. These methods can determine the type of contact behavior and the interface properties.