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Crystallization of HfO2

 
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Feb15-07, 12:49 AM   #1
 

Crystallization of HfO2


HfO2 is considered to be used as a dielectric but if it crystallizes locally its electrical properties becomes unstable. This happens around 700-800 C, which is below where most semiconductor anneals require. Shouldn't this preclude its use?
 
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Feb22-07, 02:35 PM   #2

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http://www.electrochem.org/meetings/...s/210/1129.pdf
 
Feb22-07, 06:49 PM   #3
 
Thanks for the paper link, very interesting. The conducting AFM is telling, since it always detects current through the dielectric, just a matter of degree of uniformity.
 
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