Thank you for your reply.
It was from notes provided by my school (semiconductor lithography).
It suggests the illuminated area. When the positive resist on the substrate is exposed to light, it becomes soluble and is washed off. This leaves a feature on the substrate. The line width was...
According to the formula, an increase in numerical aperture leads to a decrease in minimum line width and thus better resolution.
However, if were to draw it out, given the same depth of focus, why does the minimum line width increase with higher numerical aperture?
I understand that the particle will be polarised according to its dielectric constant and the electric field across the capacitor.
However, since it is similar to an insulator and electrons do not move in and out of the particle easily, the particle will not be charged.
How then will...
Thank you for your reply, but I still have some queries.
Do you mean to say that when the particles are in contact with each other and when electrons move from A to B, there is electron current from A to B?
Since the current is voltage divided by resistance, the higher the conductivity, the...
I understand that electrical conductivity is a measure of how easily charges are able to move in an object.
During charging by conduction (for conductors), it seems that we simply have to add the charges of both object together and divide by two to obtain the resultant charge of either object...