SUMMARY
The discussion focuses on calculating the equilibrium electron and hole concentrations in silicon at 300K, given a donor density (ND) of 2×109 cm−3, an acceptor density (NA) of 0, and intrinsic carrier concentration (ni) of 8.2×109 cm−3. The correct formulas used are n0 = (ND - NA) / 2 + √[(ND - NA) / 22 + ni2] and p0 = ni2 / n0. The calculated values are n0 = 9.26×109 and p0 = 7.26×109, but a typo in the equation led to incorrect results in an online quiz.
PREREQUISITES
- Understanding of semiconductor physics
- Familiarity with equilibrium carrier concentration equations
- Knowledge of intrinsic carrier concentration values
- Proficiency in algebraic manipulation of equations
NEXT STEPS
- Review the derivation of semiconductor carrier concentration equations
- Learn about the significance of intrinsic carrier concentration in silicon
- Explore common typos and pitfalls in semiconductor calculations
- Investigate variations in intrinsic carrier concentration values across different sources
USEFUL FOR
Students and professionals in electrical engineering, materials science, and semiconductor physics who are involved in calculations related to electron and hole concentrations in semiconductors.