SUMMARY
Integrated circuits using Gallium Nitride (GaN) High Electron Mobility Transistors (HEMTs) have not been widely adopted due to challenges in producing GaN PMOS devices, which limits integration levels. The practical limit for NMOS-only logic is approximately 300,000 transistors per chip, restricting applications to small processors and specialized DSP tasks. The high cost of GaN, approximately 100 times that of silicon, along with complex manufacturing processes and substrate issues, further hinders the development of commercial GaN microprocessors and integrated circuits.
PREREQUISITES
- Understanding of GaN HEMT technology
- Familiarity with NMOS and PMOS transistor types
- Knowledge of integrated circuit design principles
- Awareness of semiconductor manufacturing processes
NEXT STEPS
- Research GaN PMOS device fabrication techniques
- Explore advancements in GaN microprocessor development
- Study the cost-benefit analysis of GaN versus silicon in IC applications
- Investigate the thermal performance advantages of GaN in high-power applications
USEFUL FOR
Engineers, semiconductor researchers, and professionals involved in integrated circuit design and manufacturing, particularly those focused on high-performance and high-temperature applications.