The discussion centers on the feasibility of creating a thermoplastic polymer that also functions as a photoresist. Participants explore the potential for polymers to exhibit both thermoplastic and photoactive properties, referencing mechanisms that could enable this dual functionality. The conversation highlights the need for innovative polymer chemistry to achieve these characteristics, suggesting that existing photoresist materials may serve as a foundation for development.
PREREQUISITESChemists, materials scientists, and engineers interested in polymer development, particularly those focused on innovative applications in photonics and thermoplastics.