- #1
Ahsan Khan
- 270
- 5
Hello all,
I am somewhat confused in understanding the depletion region of a p-n junction diode.Everywhere a depletion region is defined as a region near the p-n junction which is devoid of charge carriers.And the formation of this region is said is explain that it is due to the diffusion of majority charge carriers of p-type crystal into n-type(movement of hole from p and electrons from n), and the diffusion of the carriers(electrons and holes) results into a region which is devoid of charge carriers(there however are ions in the depletion region i.e an anions(-ve) in p and cations(+ve) in n, as such in the formation of p-type intrinsic semiconductor it is doped with trivalent atom which creates hole as majority carrier by accepting an electron thereby become -vely charged ion or anion and the n type has electrons and +vely charged ion or cation)Thus the width of depletion region should be a space within the junction which has no charge carriers(electron or hole) but charged ions(cations on one side and anions on the other side of the junction)As the loss of holes in p side and loss of electrons in n side(during the formation of junction, i.e. on sandwiching them) are equal and the number of anions in p side of the depletion region is also equal to the loss of holes on that side similarly number of cations on the n side of depletion region is equal to the loss of electrons on that side.It means the region on right of depletion(p-side) has equal number of holes(after diffusion) and anions(so the region is neutral) and also that to left of depletion region(n side) will have equal number of electrons(after diffusion) and cations.So the only area of negative and positive charge is the depletion region in which on one side we have charged ions of one type(-ve ions) and on the other side ions of another type(+ve ions).This what is studied, further i studied the concept of potential barrier, forward biasing and reverse biasing.There is however coming a gap between formation of depletion layer and development of potential barrier.The formation of depletion region is clear(I explained in detail what i understand how it forms(concept of diffusion) and what it is made of(+ve and -ve ions)and that region to right and left of depletion region is neutral, this makes me think the following- 1-As the right and left of depletion is neutral, the only source of formation of potential; barrier is the ions in the sides of the deplettion region. 2-As these ions build up the potential, the higher their number the higher the potential barrier. 3-In forward biasing the hole and electron migrate toward the depletion region.Therefore a larger portion on the sides near the junction will be devoid of charge(due to further combination of hole and electron due to applied electric field or voltage)So the thickness of depletion region should increase, while it is well known that during forward biasing depletion layer thickness decreases.This is what i am not understanding. I know is must missing something.please make me understand why deletion layer decreases.Also let me make clear that on forward biasing, do the holes and electron(which moved due to applied voltage) cross the junction or just remain in the depletion region(which was formed during the formation of p-n junction after they were sandwiched)? [/B
I am somewhat confused in understanding the depletion region of a p-n junction diode.Everywhere a depletion region is defined as a region near the p-n junction which is devoid of charge carriers.And the formation of this region is said is explain that it is due to the diffusion of majority charge carriers of p-type crystal into n-type(movement of hole from p and electrons from n), and the diffusion of the carriers(electrons and holes) results into a region which is devoid of charge carriers(there however are ions in the depletion region i.e an anions(-ve) in p and cations(+ve) in n, as such in the formation of p-type intrinsic semiconductor it is doped with trivalent atom which creates hole as majority carrier by accepting an electron thereby become -vely charged ion or anion and the n type has electrons and +vely charged ion or cation)Thus the width of depletion region should be a space within the junction which has no charge carriers(electron or hole) but charged ions(cations on one side and anions on the other side of the junction)As the loss of holes in p side and loss of electrons in n side(during the formation of junction, i.e. on sandwiching them) are equal and the number of anions in p side of the depletion region is also equal to the loss of holes on that side similarly number of cations on the n side of depletion region is equal to the loss of electrons on that side.It means the region on right of depletion(p-side) has equal number of holes(after diffusion) and anions(so the region is neutral) and also that to left of depletion region(n side) will have equal number of electrons(after diffusion) and cations.So the only area of negative and positive charge is the depletion region in which on one side we have charged ions of one type(-ve ions) and on the other side ions of another type(+ve ions).This what is studied, further i studied the concept of potential barrier, forward biasing and reverse biasing.There is however coming a gap between formation of depletion layer and development of potential barrier.The formation of depletion region is clear(I explained in detail what i understand how it forms(concept of diffusion) and what it is made of(+ve and -ve ions)and that region to right and left of depletion region is neutral, this makes me think the following- 1-As the right and left of depletion is neutral, the only source of formation of potential; barrier is the ions in the sides of the deplettion region. 2-As these ions build up the potential, the higher their number the higher the potential barrier. 3-In forward biasing the hole and electron migrate toward the depletion region.Therefore a larger portion on the sides near the junction will be devoid of charge(due to further combination of hole and electron due to applied electric field or voltage)So the thickness of depletion region should increase, while it is well known that during forward biasing depletion layer thickness decreases.This is what i am not understanding. I know is must missing something.please make me understand why deletion layer decreases.Also let me make clear that on forward biasing, do the holes and electron(which moved due to applied voltage) cross the junction or just remain in the depletion region(which was formed during the formation of p-n junction after they were sandwiched)? [/B