What Is Planar Technology in Semiconductor Sensors?

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SUMMARY

Planar technology is a fundamental process in semiconductor sensor fabrication that involves manipulating the silicon wafer surface through a series of operations. Key procedures include heat treatment methods such as diffusion, oxidation, and tempering; deposition techniques like Chemical Vapor Deposition (CVD), epitaxy, and evaporation; lithography for defining geometries; and chemical attacks for selective material removal. Doping processes, including ion implantation and diffusion, are also critical in preparing integrated circuits. These techniques collectively enable the creation of complex semiconductor devices.

PREREQUISITES
  • Understanding of silicon wafer processing
  • Familiarity with semiconductor fabrication techniques
  • Knowledge of Chemical Vapor Deposition (CVD) methods
  • Experience with lithography techniques
NEXT STEPS
  • Research advanced lithography techniques in semiconductor manufacturing
  • Explore the principles of Chemical Vapor Deposition (CVD) in detail
  • Study the effects of doping methods on semiconductor properties
  • Investigate the role of thermal processes in integrated circuit fabrication
USEFUL FOR

Engineers, semiconductor researchers, and students in electronics who are interested in the processes involved in semiconductor sensor technology and integrated circuit design.

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what is planar technology?
 
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Planar technology: working the silicon wafer surface by repeating a series of basic operations.

Heat treatment: diffusion, oxidation, tempering.
Deposition: CVD, epitaxy, evaporation.
lithography: definition of geometry.
chemical attacks: dry and wet for the selective removal of material.
doping: ion implantation and diffusion.
etc. etc.

These are the common procedures for the preparation of an integrated circuit.
 

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