- #1
depot123
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Im trying to etch 525um (100) p-type silicon, and i intend to use HF+HNO3+CH3COOH for high etching rate since i need to etch 525um of Si. does anyone know what ratio should i use to obtain high etching rate?
I am trying to look for a mask that is able to withstand the attack of the etching solution, would the teflon tape withstand the cp4 attack? if not, can anyone with experieces let me know what can withstand etching solution's attack?
thank
I am trying to look for a mask that is able to withstand the attack of the etching solution, would the teflon tape withstand the cp4 attack? if not, can anyone with experieces let me know what can withstand etching solution's attack?
thank