Copper Electroplating, cell voltage = 0V?

In summary, the conversation discusses the scenario of anode and cathode made from copper immersed in CuSO4 aqueous solution and the resulting cell voltage. It is determined that in this scenario, the cell voltage would be 0V and the CuSO4 molar concentration does not affect it. The conversation also touches on the determination of activity coefficient in the Nernst equation and the use of SHEs on different electrode materials. The concept of concentration cell and its relation to electroplating is also mentioned.
  • #1
tinska.h
8
0
Please post this type of questions in the HW section using the template.
Hello everybody,

this is probably a very novice question, but imagine anode and cathode, both made from copper immersed in CuSO4 aqueous solution (1M at standard temp and pressure + assuming electrodes are very near each other -> minimizing diffusion/migration resistance) and:

Cu(2+) + 2e- -> Cu(s) = 0.337V (SHE)
and
Cu(s) <- Cu(2+) + 2e- = -0.337V (SHE)

In this scenario would the cell voltage be 0V? In literature and articles Ecell is usually defined as Ecell = Eox + Ered.

If this is correct, does the CuSO4 molar concentration affect Ecell if electrodes are very near each other? How does one determine activity coefficient in Nernst equation?

Thanks!
 
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  • #2
Yes, E cell would be 0. Activity - as a first approximation - equals ion concentration. Google "concentration cell".
 
  • #3
Thanks for the help.

In concentration cell, it would need to have concentration gradient. But what about in electroplating bath, where concentration is quite stable across the bath? How do I determine Ecell deviation from SHE for example in 0.1M CuSO4 or 5M CuSO4?

Also, since SHEs are performed on Platinum (or platinized?) electrode, are there analytical methods for determining overpotentials for various different electrode materials? Or are there good lists available? For example does oxygen evolution differ from SHE on copper electrodes?

Thanks!
 
  • #4
In electroplating you force voltage upon the cell, so the voltage of the cell itself doesn't matter (much).
 

1. What is copper electroplating?

Copper electroplating is a process in which a layer of copper is deposited onto a metal surface through an electrochemical reaction.

2. How does copper electroplating work?

In copper electroplating, the metal surface to be plated (usually a conductive material such as iron or steel) is submerged in an electrolyte solution containing copper ions. An electric current is then passed through the solution, causing the copper ions to be attracted to and deposited onto the metal surface.

3. What is the purpose of using a cell voltage of 0V in copper electroplating?

A cell voltage of 0V means that no external electric current is being applied to the electroplating process. This allows for a more controlled and precise deposition of copper onto the metal surface, resulting in a uniform and high-quality plating.

4. Can copper electroplating be done on non-metallic surfaces?

No, copper electroplating can only be done on conductive surfaces. Non-metallic surfaces, such as plastics or ceramics, cannot conduct electricity and therefore cannot be electroplated.

5. What are the applications of copper electroplating?

Copper electroplating is commonly used in industries such as electronics, automotive, and decorative arts. It is used to protect metals from corrosion, improve their appearance, and create conductive surfaces for electronic components.

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