Atomic Layer Deposition question

  • Thread starter Thread starter harry_harrin
  • Start date Start date
  • Tags Tags
    Atomic Deposition
Click For Summary

Discussion Overview

The discussion focuses on the atomic layer deposition (ALD) process, specifically addressing the effects of non-uniform substrate heating on chemical bonding and potential ablation. Participants explore the implications of thermal expansion differences between materials in the context of a university project.

Discussion Character

  • Exploratory, Technical explanation, Debate/contested

Main Points Raised

  • One participant questions the impact of non-uniform substrate heating on chemical bonding and the possibility of ablation, expressing confusion about acceptable temperature variations.
  • Another participant suggests that differing coefficients of thermal expansion (CTE) between the substrate and coating could lead to tension and compression issues, depending on the material types involved.
  • A further point is raised regarding the diffusion of deposition species into the substrate and its potential effects on the microstructure at the interface.
  • Concerns about grain growth issues at high substrate temperatures are mentioned, although it is noted that the atomic layer thickness may mitigate some of these concerns.
  • Participants clarify that the specific case under discussion involves a metal layer deposited on a ceramic substrate, emphasizing the nanometer range of thickness.
  • It is noted that if the metal has a higher CTE than the ceramic, the metal would be under tension while the ceramic would be under compression as the metal cools and shrinks.

Areas of Agreement / Disagreement

Participants express varying viewpoints on the implications of thermal expansion differences and the effects of substrate heating, indicating that multiple competing views remain without a clear consensus.

Contextual Notes

Participants highlight the importance of understanding the specific material properties, such as CTE, and the potential for microstructural changes, but do not resolve the uncertainties regarding acceptable temperature variations or the extent of the issues raised.

harry_harrin
Messages
5
Reaction score
0
Hi all,

I'm looking at the ALD process for a uni project and could do with some clarification on a couple of points. Does anyone have any idea what the effect of non-uniform substrate heating would be? Would it harm the chemical bonding and cause ablation? I can't seem to find out from anywhere what an acceptable temp. variation would be. Very confused!
 
Engineering news on Phys.org
If the substrate and coating have very different coefficients of thermal expansion then one will be under tension and the other compression.

Is this metal-to-metal and are they similar crystal structure, or is this ceramic to metal, metal to ceramic, or ceramic to ceramic?

Also, one would have to look at the diffusion of the deposition species into the substrate, and whether that changes the microstructure at the interface.

There could also be grain growth issues if the temperature of the substrate gets sufficiently high.

However, if this is atomic layer - nanometers thick, some of these issues may not be of concern.
 
The case I'm looking at is metal to ceramic and it is the nanometer range of thickness
 
harry_harrin said:
The case I'm looking at is metal to ceramic and it is the nanometer range of thickness
Ceramic substrate with metal layer?

Look at the CTE's. As the metal cools and shrinks, I would expect it would be under tension and the ceramic under compression - assuming the CTE of metal > CTE of ceramic.
 

Similar threads

Replies
1
Views
3K
  • · Replies 19 ·
Replies
19
Views
10K
  • · Replies 6 ·
Replies
6
Views
3K
Replies
12
Views
5K
  • · Replies 5 ·
Replies
5
Views
4K
Replies
8
Views
3K
  • · Replies 4 ·
Replies
4
Views
3K
  • · Replies 41 ·
2
Replies
41
Views
22K
  • · Replies 8 ·
Replies
8
Views
4K
  • · Replies 9 ·
Replies
9
Views
5K