Calc Electron & Hole Concen in Silicon at 300K

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Homework Help Overview

The discussion revolves around calculating the equilibrium electron and hole concentrations in silicon at a temperature of 300K, given specific donor and acceptor densities, as well as intrinsic carrier concentration.

Discussion Character

  • Mathematical reasoning, Assumption checking

Approaches and Questions Raised

  • Participants discuss the application of the provided equations for electron and hole concentrations, with some questioning the accuracy of the original poster's calculations and the values used for intrinsic carrier concentration.

Discussion Status

There is ongoing clarification regarding the equations used, particularly concerning potential typographical errors in the mathematical expressions. Some participants have confirmed the calculations while others are exploring the implications of different values for intrinsic carrier concentration.

Contextual Notes

Participants note discrepancies in the intrinsic carrier concentration values found in various sources, suggesting that the value provided in the problem statement should be adhered to despite variations in other references.

bobred
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Homework Statement


For silicon at T=300K with donor density ND=2×109cm−3, acceptor density NA=0 and ni=8.2×109cm−3, calculate the equilibrium electron and hole concentration

Homework Equations


n_0=\frac{N_D-N_A}{2}+\sqrt{\frac{N_D-N_A}{2}^2+n_i^2}

p_o=\frac{n_i^2}{n_0}

The Attempt at a Solution


I get
n_0=9.26\times10^9 and p_0=7.26\times10^9
But whenever I enter the results into the online quiz it says it's wrong, am I missing something here?
 
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bobred said:
$$n_0= \frac{N_D-N_A}{2}+\sqrt{\frac{N_D-N_A}{2}^2+n_i^2}$$​
Check your electron concentration equation again, you may be missing a parenthesis inside the square root.
 
Last edited:
Yes there is a typo, the calculation was correct though, it should be

<br /> n_0=\frac{N_D-N_A}{2}+\sqrt{\frac{(N_D-N_A)}{2}^2+n_i^2}<br />
 
bobred said:

Homework Statement


For silicon at T=300K with donor density ND=2×109cm−3, acceptor density NA=0 and ni=8.2×109cm−3, calculate the equilibrium electron and hole concentration
This might not be relevant, but the value of ##n_i## given here for Si at 300 K is somewhat smaller than values that I have found in a search on the internet (which tend to be between 1.0 x 1010 cm-3 and 1.5 x 1010 cm-3). But I did come across one site that listed a value close to your value. Certainly, if the value you used is the value that is given in the statement of the problem, then you should use it.
 
Last edited:
I have seen similar values too, but the value was given on a sheet of constants. Can't see where the problem is.
 
bobred said:
Yes there is a typo, the calculation was correct though, it should be

<br /> n_0=\frac{N_D-N_A}{2}+\sqrt{\frac{(N_D-N_A)}{2}^2+n_i^2}<br />
Still looks like a typo is present. The denominator of 2 inside the root should be squared. But I agree with your calculated value for ##n_0##.
 
You are correct TSny, I was rushing and didn't check it properly.
 

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