My question has to do with Sputtering Silicon onto a substrate using DC without a Magnetron. The system in the lab I'm at isn't currently capable of RF sputtering and the status of the magnetron is unknown. Is there any way to use a sputter with DC to deposit Silicon onto a substrate? On the off chance anyone knows, is there a way to sputter Aluminum Oxide onto a substrate without a magnetron, RF, or exposing the chamber to the atmosphere? We need a deposition that's around 50nm-250nm thick. Any help would be appreciated!