SUMMARY
The discussion centers on the concept of electropositive ion flux in plasma, specifically in the context of measuring plasma density within a Plasma Enhanced Chemical Vapor Deposition (PECVD) chamber. It is established that electropositive ion flux is not directly equivalent to plasma density but can be proportional under certain conditions. The conversation highlights the complexities of plasma behavior, particularly in cold plasmas, and the necessity of understanding plasma physics to accurately convert measured currents into plasma density. The user is developing a sensor to measure plasma density using an Argon plasma excited at 75kHz.
PREREQUISITES
- Understanding of plasma physics concepts, particularly ion and electron behavior.
- Familiarity with Plasma Enhanced Chemical Vapor Deposition (PECVD) processes.
- Knowledge of current measurement techniques in plasma environments.
- Basic principles of electrical engineering related to sinusoidal voltage applications.
NEXT STEPS
- Research "Plasma density measurement techniques" to explore various methodologies.
- Study "Dispersion interferometry" for measuring plasma densities in cold plasmas.
- Investigate "Plasma sheath theory" to understand current contributions in plasma measurements.
- Examine "Electropositive vs. electronegative plasma characteristics" for broader context.
USEFUL FOR
This discussion is beneficial for researchers and engineers involved in plasma physics, particularly those working on sensor development for plasma density measurement in semiconductor manufacturing processes.