Electrially Insulating Deposition PVD,CVD?

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In summary, one potential solution for your problem is to use a two-step deposition process, with an initial electroless nickel plating followed by a dielectric layer deposition.
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Mike_In_Plano
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I'm looking to develop a process for direct deposition of temperature dependent resistive material on a hastelloy or pure nickel substrate. My problem is plating an insulating layer between the two materials.

I need the insulation to be fairly robust as it must survive a 500 volt dielectric test and it must survive bond wire application afterwards.

We've played with sputtering on dielectrics, but generally haven't had much success. Any ideas would be greatly appreciated.

Thanks,

Mike
 
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One possible solution for your problem might be to use a two-step deposition process. For the first step, you can use an electroless plating technique to deposit a thin layer of nickel onto the Hastelloy or pure nickel substrate. This layer should be thick enough to ensure proper adhesion of the dielectric layer, but thin enough that it won't interfere with the electrical properties. For the second step, you can deposit the dielectric layer using one of several techniques such as sputtering, evaporation, or chemical vapor deposition. Depending on the specific requirements of your application, you may need to experiment with different deposition methods and materials to find the best combination of electrical and mechanical properties.
 

1. What is PVD and how does it work?

PVD stands for "Physical Vapor Deposition" and is a process where a material is vaporized and then deposited onto a substrate to form a thin film. This is typically done in a vacuum chamber using techniques such as sputtering or evaporation.

2. What is CVD and how is it different from PVD?

CVD stands for "Chemical Vapor Deposition" and is a process where a material is deposited onto a substrate through chemical reactions. This is typically done at high temperatures and can create more complex and precise coatings compared to PVD.

3. Why is electrical insulation important in deposition processes?

Electrical insulation is important in deposition processes because it helps to prevent electrical currents from interfering with the coating being deposited. This can help to ensure a more uniform and controlled coating, as well as prevent any potential damage to the equipment.

4. What materials are commonly used for electrical insulation in PVD and CVD?

Some common materials used for electrical insulation in PVD and CVD processes include ceramics, such as silicon nitride or aluminum oxide, as well as polymers like polyimide or parylene. These materials have high dielectric strengths and can withstand the high temperatures and vacuum conditions of deposition processes.

5. What are some applications of electrially insulating deposition in industries?

Electrially insulating deposition is used in a variety of industries, including semiconductor manufacturing, optics and photonics, and aerospace. It is used to create thin films for purposes such as barrier coatings, optical filters, and protective layers for electronic components.

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