SUMMARY
The discussion centers on the impact of lasers on the threshold voltage of power-off transistors, specifically MOSFETs at 65 nm or 55 nm technology nodes. It is established that high-powered lasers can induce thermal effects that may alter the threshold voltage by causing degradation through thermal migration of materials. However, targeting individual transistors in a CMOS circuit is impractical due to the minimum spot size of lasers, and while localized heating could potentially change transistor characteristics, it is more likely to damage the circuit rather than provide a viable cybersecurity threat.
PREREQUISITES
- Understanding of MOSFET technology, particularly at 65 nm and 55 nm nodes
- Knowledge of laser parameters, including wavelength and power
- Familiarity with thermal effects on semiconductor materials
- Basic principles of CMOS circuit design and packaging
NEXT STEPS
- Research the Arrhenius equation and its application in semiconductor degradation
- Explore the effects of localized heating on MOSFET characteristics
- Investigate laser types and their specific impacts on semiconductor materials
- Study cybersecurity implications of physical attacks on integrated circuits
USEFUL FOR
Hardware security researchers, semiconductor engineers, and cybersecurity professionals interested in the effects of physical attacks on integrated circuits.