Oxygen and hydrogen atoms on the diamond's surface

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SUMMARY

The presence of hydrogen and oxygen atoms on the surface of diamond significantly contributes to its ultralow coefficient of friction. According to the paper "Origin of ultralow friction and wear in ultrananocrystalline diamond" by AR Konicek et al., the mechanism involves the passivation of dangling bonds, supported by definitive spectroscopic evidence. This process is influenced by contact stress, sliding rate, temperature, and the dissociative adsorption of water vapor, which is affected by relative humidity (RH) and reciprocation frequency.

PREREQUISITES
  • Understanding of ultrananocrystalline diamond properties
  • Familiarity with spectroscopic techniques in material science
  • Knowledge of friction mechanisms and wear processes
  • Basic principles of surface chemistry and adsorption
NEXT STEPS
  • Research the role of water vapor in friction reduction on diamond surfaces
  • Study the effects of relative humidity on material wear
  • Explore advanced spectroscopic methods for analyzing surface passivation
  • Investigate the relationship between contact stress and friction in nanomaterials
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Material scientists, tribologists, and engineers focused on friction reduction and wear in advanced materials, particularly those working with diamond coatings and nanostructured surfaces.

PatrickP2
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Is it true that hydrogen and oxygen atoms on the surface of diamond make it have such a low coefficient of friction?
 
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From the paper "Origin of ultralow friction and wear in ultrananocrystalline diamond" by AR Konicek, DS Grierson, P Gilbert, WG Sawyer, AV Sumant, RW Carpick (Physical review letters, 100, 235502 (2008)):

“The mechanism of low friction supported by this spectroscopy is passivation of dangling bonds [1,3,4,35]. This is the first definitive spectroscopic evidence supporting the passivation hypothesis. This mechanism hinges on a balance between the processes of bond breaking during each sliding pass (which depends on contact stress, sliding rate, and temperature) and passivation by dissociative adsorption of gaseous species, in particular, water vapor (which depends on RH and reciprocation frequency [36,37]).”
 
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