Hi there, I need to fabricate a stack of layers (about 15 layers) on a 100 mm Si wafer <100> , by alternating SiO2 and Si. Each layer has been designed with a thickness of 200~800 nm plus/minus 50 nm. At the moment I don't know the best technique for the deposition as I need to yield samples with a very good optical uniformity. Thank you for your attention. A.