Ways to minimize scattering as T increases

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Discussion Overview

The discussion centers around strategies to minimize Coulomb and phonon scattering in MOSFETs as temperature increases, particularly in the context of ring oscillators and circuit performance. Participants explore various approaches, including semiconductor material engineering and circuit compensation, while considering the implications of temperature on frequency degradation.

Discussion Character

  • Exploratory
  • Technical explanation
  • Debate/contested

Main Points Raised

  • One participant inquires about methods to prevent or minimize scattering in MOSFETs as temperature rises, referencing a specific figure from a paper.
  • Another participant suggests using liquid nitrogen for cooling, but this is later dismissed due to constraints on cooling the device.
  • Participants discuss semiconductor material engineering as a potential solution, mentioning strategies like improving surface state density through better dielectrics, reducing phonon scattering via strain and isotropic doping, and minimizing surface scattering by reducing surface roughness.
  • Questions arise regarding the meaning of "improving surface state density" and "isotropic doping," with one participant seeking clarification on these terms and their implications for scattering and mobility.
  • There is a discussion about the limitations of using silicon as a semiconductor material, with alternatives like GaN, diamond, GaO, and SiC being proposed, along with considerations of intrinsic carriers at elevated temperatures.

Areas of Agreement / Disagreement

Participants express varying opinions on the effectiveness of different strategies to minimize scattering, and there is no consensus on the best approach or the limitations of materials used.

Contextual Notes

Participants acknowledge the complexity of the topic, including the need for further clarification on technical terms and the implications of material choices on performance as temperature increases.

Who May Find This Useful

Researchers and engineers interested in semiconductor physics, MOSFET design, and circuit performance at elevated temperatures may find this discussion relevant.

ZeroFunGame
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TL;DR
as temperature rises in a MOSFET, are there tricks to prevent the Coulomb/phonon scattering? Or at least minimize it?
as temperature rises in a MOSFET, are there tricks to prevent the Coulomb/phonon scattering? Or at least minimize it?

This is in reference to Fig 4 here:
https://pdfs.semanticscholar.org/f8a0/b9b7030f7201ef17c6ff66ec660fd75c7aae.pdf

The more overarching question is related to ring oscillators and circuits in general, and whether there is a way to minimize frequency degradation as temperature is increased.
 
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Dip the circuit in liquid nitrogen.
 
Added the caveat that you cannot cool the device :)

I was thinking semiconductor material engineering, or circuit compensation, etc. Not sure if these actually exist as solutions
 
ZeroFunGame said:
Added the caveat that you cannot cool the device :)

I was thinking semiconductor material engineering, or circuit compensation, etc. Not sure if these actually exist as solutions

Improve surface state density via improved dielectrics, reduce phonon scattering via strain and isotropic doping, reduce surface scattering by reducing surface roughness. There's a few more, but I guess standard channel engineering tricks to boost mobility is the way to go
 
ZeroFunGame said:
Improve surface state density via improved dielectrics
Could you explain what you mean by this quote above?

What is isotropic doping?

Could you also talk about your limitations? For example, must you use silicon?
 
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Dr_Nate said:
Could you explain what you mean by this quote above?

What is isotropic doping?

Could you also talk about your limitations? For example, must you use silicon?

My understanding is that you want to reduce interface states and charge traps, as this could lead to greater scattering at the dielectric semiconductor interface, thus reducing mobility (please correct me if I am mistaken)

Isotropic doping, I assume means uniform doping as a function of depth, but my understanding here could be mistaken.

Limitations? No, you don't have you use silicon. For example, why not use GaN since they have a wide bandgap. But then the limitations wouldn't be interface states or doping since it's a HEMT structure. Diamond or GaO or SiC could be another option. I'm not sure what you mean by limitations -- for Si, it's the dominance of intrinsic carriers as T increases
 
Last edited:

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