|May15-12, 01:28 AM||#1|
calculating moleculalar flux from deposition rate.
I have deposition rate of Silicon dioxide as 1000A/minute. I need to calculate molecular flux to the surface. First I tried to use ideal gas theory but since SiO2 is not ideal gas therefore my answer was completely wrong. I am disoriented. Can any body help. I know the answer is 3.8E15 molecules/cm2 second.
PS: It is not homework assignment. I need to calculate it to determine flux ratio.
|May15-12, 08:58 AM||#2|
What is the process for deposition?
|May15-12, 05:09 PM||#3|
It is evaporated using e-gun in UHV of around 10-9 Torr.
|deposition rate, molecular flux|
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