Effect of Doping Levels on Width of Depletion Region

AI Thread Summary
Increasing the doping levels in a PN junction reduces the width of the depletion region due to a higher concentration of free carriers that neutralize the charges on ions. However, this also raises the concentration of ions in the depletion region, leading to a potential increase in width, creating a contradiction in initial assumptions. The drift current increases with higher doping levels due to a stronger electric field, while the diffusion current decreases, suggesting that equilibrium is reached more quickly in heavily doped junctions. The discussion highlights the complexity of the relationship between doping levels and depletion width, indicating that formulas may be necessary for precise calculations. Overall, the interplay of these factors requires careful consideration to understand the effects on the depletion region.
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Homework Statement


The problem is what would be the effect on the width of the depletion region of an unbiased PN junction on the doping levels of the P and N sides


Homework Equations



This is a conceptual question. There is no equation involved.

The Attempt at a Solution



Increase in doping level implies more free carriers (electrons in the n side and holes in the p side) available for diffusion. Thus the greater number of such available free carriers (as compared to the number of free carriers available for a lesser doping level) would neutralise the charges on a greater number of ions (positive and negative) in the depletion region. Hence the net effect would be to reduce the width of the depletion region.
I would request for a ratification of the correctness of this understanding. Thanks.
 
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But what happens to the concentration of ions in the depletion region when you increase the doping level?
 
The concentration of ions goes up with increase in the doping level. Does this, therefore, imply that the width of the depletion region will increase for higher doping levels? It looks as if my initial thinking was not right.
 
One more thing. With a higher doping level the drift current should go up due to the higher electric field at the junction, and the diffusion current should go down due to the same reason. The net effect should be that the equilibrium condition would be attained faster in this case than if the junction were lightly doped.
 
I really don't know if you can solve this without using any formulas, since there seems to be a lot of factors. These are the formulas I would use

W = \sqrt{\frac{2\epsilon_r\epsilon_0 V_j}{q}\left(\frac{1}{N_a} + \frac{1}{N_d} \right)}, where
V_j = V_0 = \frac{kT}{q}\ln \left( \frac{N_aN_d}{n_i^2} \right) for an unbiased junction

Hope this helps :)
 
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