the target source is the same in both cases, no imaging done, if it depend on what material i used, how should i know whether with bias or without bias will be appropriate?
i am using XRF measurement to obtain the thickness of layer. thanks.
Hi, I would like to know when deposition using DC sputtering, bias play a role in plasma build-up, but with bias applied and without bias applied, still obtain the same thickness of thin film layer, what actually the differences between bias and without bias during DC sputtering? Thanks.
is polycrystalline that i am interested. from debye-scherrer formula where D = k(lamda)/(FWHM)(costheta). i wan to connect spacing and grain size. is it possible? i thought spacing is directly proportional to grain size.
In XRD, to examine the diffraction pattern and the determine the elemental structure, a thin layer of sample is deposit on a substrate. since x ray penetrate deeper than electron, how the thickness of the sample will affect the XRD result? how do know what is the appropriate thickness to...
what can be interpret from dispersion curve of phonon?how to find whether a phonon can loose all its energy to a neutron from dispersion curves?are there dispersion curves for other atom apart from phonon?
In deposition of thin film on a p-type silicon, how to make sure the thickness of the thin film will not affect or affect the least the electrical(Hall Effect) and structural properties? how to know how thick is the thin film that most suitable? can it be calculated? by the way, the thin film...
to find mass of indium chloride, InCl3, needed as dopant to dope in zinc oxide...Is it number of atoms dopant(indium in this case) divided by number of molecules of zinc oxide equal to 1%?