SUMMARY
The discussion centers on lowering the threshold voltage (Vth) of MOSFETs for rectifier designs targeting input voltages around 100mV. Key mechanisms for adjusting Vth include using Boron threshold adjustment implants for NMOS and corresponding techniques for PMOS, which are standard in modern IC processes. However, the fixed boron dose limits the ability to modify Vth unless specified during fabrication. The use of a Low-Noise Amplifier (LNA) is suggested as a potential solution, contingent on the availability of an external power supply.
PREREQUISITES
- Understanding of MOSFET operation and characteristics
- Familiarity with threshold voltage (Vth) concepts
- Knowledge of semiconductor fabrication processes
- Basic principles of Low-Noise Amplifiers (LNAs)
NEXT STEPS
- Research techniques for Boron threshold adjustment in NMOS fabrication
- Explore PMOS threshold voltage adjustment methods
- Investigate the design and application of Low-Noise Amplifiers (LNAs)
- Learn about IC fabrication specifications and customization options
USEFUL FOR
Electrical engineers, semiconductor designers, and anyone involved in low-voltage rectifier circuit design or MOSFET technology optimization.