Integrated circuits made with GaN HEMTs

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Discussion Overview

The discussion revolves around the challenges and limitations of using Gallium Nitride (GaN) High Electron Mobility Transistors (HEMTs) for integrated circuits. Participants explore the reasons behind the limited adoption of GaN in commercial microprocessors and integrated circuits, focusing on technical, economic, and material-related factors.

Discussion Character

  • Exploratory
  • Technical explanation
  • Debate/contested

Main Points Raised

  • Some participants question why integrated circuits are not commonly made with GaN, despite the higher mobility of HEMTs.
  • It is noted that the industry has struggled to develop GaN PMOS devices until recently, which limits integration levels when only NMOS devices are available.
  • Concerns are raised about the practical limits of NMOS-only logic, with references to historical NMOS microprocessors and the potential for creating a 4-bit microprocessor using GaN n-type HEMTs.
  • Participants express curiosity about the absence of commercial GaN microprocessors or integrated circuits, questioning the barriers to designing a flash ADC despite demonstrated fast propagation delays in GaN components.
  • One participant suggests that the challenges may be process-related, citing the complexity and cost of GaN wafer production compared to silicon.
  • Another participant provides a comparative analysis of propagation delays in GaN and silicon technologies, indicating that while GaN can achieve high speeds, the cost is significantly higher.
  • It is mentioned that the main advantage of GaN lies in its performance at elevated temperatures, which makes it suitable for specific high-power applications.

Areas of Agreement / Disagreement

Participants express multiple competing views regarding the limitations of GaN in integrated circuits, with no consensus on the primary reasons for its limited use. Discussions include technical challenges, economic factors, and material properties.

Contextual Notes

Limitations discussed include the dependency on the development of GaN PMOS devices, the challenges of high-volume wafer production, and the cost implications of using GaN compared to silicon.

ZeroFunGame
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Why do people not make integrated circuits using GaN? Since HEMTs have so much higher mobility, why have they not been leveraged for integrated circuits?
Why do people not make integrated circuits using GaN? Since HEMTs have so much higher mobility, why have they not been leveraged for integrated circuits?
 
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ZeroFunGame said:
Summary:: Why do people not make integrated circuits using GaN? Since HEMTs have so much higher mobility, why have they not been leveraged for integrated circuits?

Why do people not make integrated circuits using GaN? Since HEMTs have so much higher mobility, why have they not been leveraged for integrated circuits?
Industry until recently (~2016) have struggled to make GaN PMOS devices. With NMOS devices only, maximal level of integration is limited.
 
trurle said:
Industry until recently (~2016) have struggled to make GaN PMOS devices. With NMOS devices only, maximal level of integration is limited.

What is limiting making NMOS-only logic? Most of Intel's first microprocessors were only on NMOS. Could we make a 4-bit microprocessor similar to Intel 4004 using GaN n-type HEMTs?
 
ZeroFunGame said:
What is limiting making NMOS-only logic? Most of Intel's first microprocessors were only on NMOS. Could we make a 4-bit microprocessor similar to Intel 4004 using GaN n-type HEMTs?
Practical limit of NMOS only is about 300 thousands transistors per chip. Small (8 or 16 bit) processors can be done with GaN NMOS tech, but the utility will be limited to few specialized DSP applications.
 
I tried to search for GaN microprocessors or commercial ICs made using GaN, but was not able to find any. I've seen papers on a GaN comparator and 101-stage RO, but what's preventing the design of a flash ADC? The propagation delay from the 101-stage RO was 0.1 ns, which seems to be very fast, and if they have demonstrated a comparator using e/d-mode DCFL, then why have companies not yet made an ADC using GaN? Is it mostly cost? Or do you think there is a greater technical challenge with higher levels of integration?
 
I admit I don't know the answer, but I believe it's process related. Industry has long invested and developed so much for silicon, that it's probably cheaper and easier compared to other materials.

If I am recalling correctly or at least in the right direction, then GaN wafers are a pain to make especially in high volume ie. they have to made by a more complicated process, developed on more expensive substrates like sapphire, and the lattice constant is hard to match to grown with buffer layers like AlN.

The channel lengths I hear about GaN seem to me less impressive compared to silicon transistors, but I'm not super aware of the capabilities regarding GaN and so maybe I am mistaken. I am thinking making more per wafer or the actual wafer size might be hard to achieve.

Just my guess... I don't know the answer.
 
ZeroFunGame said:
I tried to search for GaN microprocessors or commercial ICs made using GaN, but was not able to find any. I've seen papers on a GaN comparator and 101-stage RO, but what's preventing the design of a flash ADC? The propagation delay from the 101-stage RO was 0.1 ns, which seems to be very fast, and if they have demonstrated a comparator using e/d-mode DCFL, then why have companies not yet made an ADC using GaN? Is it mostly cost? Or do you think there is a greater technical challenge with higher levels of integration?
0.1ns/stage is actually not that good; modern Si CMOS routinely have 0.02ns/stage at 65nm tech scale.
Newer paper report 0.015 ns/stage with 40nm GaN tech, with is pretty comparable with the Si CMOS.
https://www.researchgate.net/publication/260589603_High-speed_501-stage_DCFL_GaN_ring_oscillator_circuits

GaN microwave devices with modern tech allows approximately doubling of speed compared to silicon, and only for specific conditions. The cost, on the other hand, is roughly 100 times higher for GaN. Therefore, i suspect it is mostly cost.
Main advantage of GaN is not baseline speed, but capability to retain good performance at elevated temperatures (up to 275C). Therefore, it is extensively used already where high power density is needed - for example, in X to Ka bands in spacecraft transmitters.
 
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